Fundamentals of Nanoscale Film Analysis
(Sprache: Englisch)
From materials science to integrated circuit development, technology is moving from the microscale toward the nanoscale. As technology grows tinier, there is new emphasis on understanding the effects of surfaces and near-surfaces on the properties of...
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From materials science to integrated circuit development, technology is moving from the microscale toward the nanoscale. As technology grows tinier, there is new emphasis on understanding the effects of surfaces and near-surfaces on the properties of materials at the nanoscale. This book reviews the fundamental physics underlying innovative techniques for analyzing these surfaces and near-surfaces.
Klappentext zu „Fundamentals of Nanoscale Film Analysis “
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.
Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
From materials science to integrated circuit development, much of modern technology is moving from the microscale toward the nanoscale. This book focuses on the fundamental physics underlying innovative techniques for analyzing surfaces and near-surfaces. New analytical techniques have emerged to meet these technological requirements, all based on a few processes that govern the interactions of particles and radiation with matter. This book addresses the fundamentals and application of these processes, from thin films to field effect transistors.
Inhaltsverzeichnis zu „Fundamentals of Nanoscale Film Analysis “
- Concepts, Units, and the Bohr Atom.- Atomic Collisions and Backscattering Spectrometry.
- Energy Loss of Light Ions and Backscattering Depth Profiles.
- Sputter Depth Profiles and Secondary Ion Mass Spectrometry.
- Ion Channeling.
- Electron -Electron Interactions and Depth Sensitivity of Electron Spectroscopies.
- X-ray Diffraction.
- Electron Diffraction.
- Photon Absorption in Solids and EXAFS.
- X-ray Photoelectron Spectroscopy.
- Radiative Transitions and Electron Microprobe.
- Nonradiative Transitions and Auger Electron Spectroscopy.
- Nuclear Techniques: Activation Analysis and Prompt Radiation Analysis.
- Scanning Probe Microscopy.-Appendices: Km for 4He as Projectile and integer Target Mass.
- Rutherford Scattering Cross Section of Elements for 1 MeV 'He.
- 4He Stopping Cross Sections.
- Electron Configurations and Ionization Potentials of Atoms.
- Electron Binding Energies (eV).
- X-ray Wavelengths.
- Mass Absorption Coefficients and Densities.
- KLL Auger Energies (eV).
- Fluorescence Yields for K, L, and M Shells.
Autoren-Porträt von Terry L Alford, L.C. Feldman, James W. Mayer
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. This book focuses on the fundamental physics underlying the techniques used to analyze the nature of surfaces and near-surfaces in the properties of materials. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Coverage includes new analytical techniques, such as x-ray fluorescence (XRF) in thin film analysis. This volume updates (with a nano focus) the well regarded 1986 book, Surface and Thin Film Analysis, by Feldman and Mayer.Bibliographische Angaben
- Autoren: Terry L Alford , L.C. Feldman , James W. Mayer
- 2010, XIV, 336 Seiten, Masse: 15,5 x 23,5 cm, Kartoniert (TB), Englisch
- Verlag: Springer, Berlin
- ISBN-10: 1441939806
- ISBN-13: 9781441939807
Sprache:
Englisch
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