Advances in Communication, Signal Processing, VLSI, and Embedded Systems

Dr. Shubhakar Kalya obtained his Master's degree in Microelectronics from Indian Institute of Science (IISc), Bangalore, India in 2007 and Ph.D. degree in the field of Nanoelectronics from School of Electrical and Electronics Engineering, Nanyang Technological University (NTU), Singapore in 2012-13. He obtained his Bachelor's Degree in Electronics and Communication Engineering from N.M.A.M. Institute of Technology, Nitte. He is working as a faculty in Engineering Product Development (EPD) Pillar at Singapore University of Technology and Design (SUTD), Singapore since Jan- 2012. His research work focuses on Nanoscale characterization of High- gate dielectrics and 2D materials for advanced logic and memory devices, and its reliability analysis. During July-2009 to Dec-2012, he has worked as a visiting researcher at Institute of Materials and Research Engineering (IMRE), Singapore, and involved in research related to characterization of High- gate dielectrics usingscanning tunneling microscopy and atomic force microscopy.  During Jan-June 2017, he was at Massachusetts Institute of Technology (MIT), Cambridge, USA as a visiting scientist. He has authored/co-authored more than 30 research publications (journals/ international conferences) and two book chapters. He is also involved in review of various technical papers including IEEE Transactions on Device and Materials reliability, Microelectronic Engineering journals and international conferences related to Nanoelectronics field.  Dr. Muralidhar Kulkarni received his B.E. (Electronics Engineering) degree from University Visvesvaraya College of Engineering, Bangalore University, Bangalore; M.Tech. (Satellite Communication and Remote Sensing) degree from Indian Institute of Technology, Kharagpur (IIT KGP); and Ph.D. from JMI Central University, New Delhi, in the area of Optical Communication Networks. He has served in various capacities in industry and academics for the last 35 years. He has