MOS Interface Physics, Process and Characterization (ePub)
(Sprache: Englisch)
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will...
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The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.
Autoren-Porträt von Shengkai Wang, Xiaolei Wang
Shengkai Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the University of Tokyo in 2011 and has been engaged in Ge, III-V, SiC in MOS technology. He has published more than 100 papers and authorized 40+ patents. Xiaolei Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the Institute of Microelectronics, Chinese Academy of Sciences in 2013 and has been engaged in Si/Ge based MOS technology. He has published more than 100 papers.
Bibliographische Angaben
- Autoren: Shengkai Wang , Xiaolei Wang
- 2021, 1. Auflage, 174 Seiten, Englisch
- Verlag: Taylor & Francis
- ISBN-10: 1000455769
- ISBN-13: 9781000455762
- Erscheinungsdatum: 04.10.2021
Abhängig von Bildschirmgrösse und eingestellter Schriftgrösse kann die Seitenzahl auf Ihrem Lesegerät variieren.
eBook Informationen
- Dateiformat: ePub
- Grösse: 9.61 MB
- Ohne Kopierschutz
- Vorlesefunktion
Sprache:
Englisch
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