Fundamentals of Semiconductor Manufacturing and Process Control / Wiley - IEEE (PDF)
(Sprache: Englisch)
A practical guide to semiconductor manufacturing from process
control to yield modeling and experimental design
Fundamentals of Semiconductor Manufacturing and Process Control
covers all issues involved in manufacturing microelectronic devices
and...
control to yield modeling and experimental design
Fundamentals of Semiconductor Manufacturing and Process Control
covers all issues involved in manufacturing microelectronic devices
and...
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A practical guide to semiconductor manufacturing from process
control to yield modeling and experimental design
Fundamentals of Semiconductor Manufacturing and Process Control
covers all issues involved in manufacturing microelectronic devices
and circuits, including fabrication sequences, process control,
experimental design, process modeling, yield modeling, and CIM/CAM
systems. Readers are introduced to both the theory and practice of
all basic manufacturing concepts.
Following an overview of manufacturing and technology, the text
explores process monitoring methods, including those that focus on
product wafers and those that focus on the equipment used to
produce wafers. Next, the text sets forth some fundamentals of
statistics and yield modeling, which set the foundation for a
detailed discussion of how statistical process control is used to
analyze quality and improve yields.
The discussion of statistical experimental design offers readers a
powerful approach for systematically varying controllable process
conditions and determining their impact on output parameters that
measure quality. The authors introduce process modeling concepts,
including several advanced process control topics such as
run-by-run, supervisory control, and process and equipment
diagnosis.
Critical coverage includes the following:
* Combines process control and semiconductor manufacturing
* Unique treatment of system and software technology and management
of overall manufacturing systems
* Chapters include case studies, sample problems, and suggested
exercises
* Instructor support includes electronic copies of the figures and
an instructor's manual
Graduate-level students and industrial practitioners will benefit
from the detailed exami?nation of how electronic materials and
supplies are converted into finished integrated circuits and
electronic products in a high-volume manufacturing
environment.
An Instructor's Manual presenting detailed solutions to all the
problems in the book is available from the Wiley editorial
department.
An Instructor Support FTP site is also available.
control to yield modeling and experimental design
Fundamentals of Semiconductor Manufacturing and Process Control
covers all issues involved in manufacturing microelectronic devices
and circuits, including fabrication sequences, process control,
experimental design, process modeling, yield modeling, and CIM/CAM
systems. Readers are introduced to both the theory and practice of
all basic manufacturing concepts.
Following an overview of manufacturing and technology, the text
explores process monitoring methods, including those that focus on
product wafers and those that focus on the equipment used to
produce wafers. Next, the text sets forth some fundamentals of
statistics and yield modeling, which set the foundation for a
detailed discussion of how statistical process control is used to
analyze quality and improve yields.
The discussion of statistical experimental design offers readers a
powerful approach for systematically varying controllable process
conditions and determining their impact on output parameters that
measure quality. The authors introduce process modeling concepts,
including several advanced process control topics such as
run-by-run, supervisory control, and process and equipment
diagnosis.
Critical coverage includes the following:
* Combines process control and semiconductor manufacturing
* Unique treatment of system and software technology and management
of overall manufacturing systems
* Chapters include case studies, sample problems, and suggested
exercises
* Instructor support includes electronic copies of the figures and
an instructor's manual
Graduate-level students and industrial practitioners will benefit
from the detailed exami?nation of how electronic materials and
supplies are converted into finished integrated circuits and
electronic products in a high-volume manufacturing
environment.
An Instructor's Manual presenting detailed solutions to all the
problems in the book is available from the Wiley editorial
department.
An Instructor Support FTP site is also available.
Inhaltsverzeichnis zu „Fundamentals of Semiconductor Manufacturing and Process Control / Wiley - IEEE (PDF)“
Preface. Acknowledgments. 1. Introduction to Semiconductor Manufacturing. Objectives. Introduction. 1.1. Historical Evolution. 1.2. Modern Semiconductor Manufacturing. 1.3. Goals of Manufacturing. 1.4. Manufacturing Systems. 1.5. Outline for Remainder of the Book. Summary. Problems. References. 2. Technology Overview. Objectives. Introduction. 2.1. Unit Processes. 2.2. Process Integration. Summary. Problems. References. 3. Process Monitoring. Objectives. Introduction. 3.1. Process Flow and Key Measurement Points. 3.2. Wafer State Measurements. 3.3. Equipment State Measurements. Summary. Problems. References. 4. Statistical Fundamentals. Objectives. Introduction. 4.1. Probability Distributions. 4.2. Sampling from a Normal Distribution. 4.3. Estimation 4.4. Hypothesis Testing. Summary. Problems. Reference. 5. Yield Modeling. Objectives. Introduction. 5.1. Definitions of Yield Components. 5.2. Functional Yield Models. 5.3. Functional Yield Model Components. 5.4. Parametric Yield. 5.5. Yield Simulation. 5.6. Design Centering. 5.7. Process Introduction and Time-to-Yield. Summary. Problems. References. 6. Statistical Process Control. Objectives. Introduction. 6.1. Control Chart Basics. 6.2. Patterns in Control Charts. 6.3. Control Charts for Attributes. 6.4. Control Charts for Variables. 6.5. Multivariate Control. 6.6. SPC with Correlated Process Data. Summary. Problems. References. 7. Statistical Experimental Design. Objectives. Introduction. 7.1. Comparing Distributions. 7.2. Analysis of Variance. 7.3. Factorial Designs. 7.4. Taguchi Method. Summary. Problems. References. 8. Process Modeling. Objectives. Introduction. 8.1. Regression Modeling. 8.2. Response Surface Methods. 8.3. Evolutionary Operation. 8.4. Principal-Component Analysis. 8.5. Intelligent Modeling Techniques. 8.6. Process Optimization. Summary. Problems. References. 9. Advanced Process Control. Objectives. Introduction. 9.1. Run-by-Run Control with Constant Term Adaptation. 9.2. Multivariate Control
... mehr
with Complete Model Adaptation. 9.3. Supervisory Control. Summary. Problems. References. 10. Process and Equipment Diagnosis. Objectives. Introduction. 10.1. Algorithmic Methods. 10.2. Expert Systems. 10.3. Neural Network Approaches. 10.4. Hybrid Methods. Summary. Problems. References. Appendix A: Some Properties of the Error Function. Appendix B: Cumulative Standard Normal Distribution. Appendix C: Percentage Points of the chi2 Distribution. Appendix D: Percentage Points of the t Distribution. Appendix E: Percentage Points of the F Distribution. Appendix F: Factors for Constructing Variables Control Charts. Index.
... weniger
Autoren-Porträt von Gary S. May, Costas J. Spanos
GARY S. MAY, PhD, is Professor in the School of Electricaland Computer Engineering at the Georgia Institute of Technology.
Dr. May is a Fellow of the IEEE and Senior Member of the Society of
Manufacturing Engineers. He has published more than 150 articles
and given over 100 technical presentations in the area of IC
computer-aided manufacturing.
COSTAS J. SPANOS, PhD, is Professor in the Department of
Electrical Engineering and Computer Sciences and the Associate Dean
for Research for the College of Engineering at the University of
California, Berkeley. Dr. Spanos is a Fellow of the IEEE and has
published extensively in the area of semiconductor
manufacturing.
Bibliographische Angaben
- Autoren: Gary S. May , Costas J. Spanos
- 2006, 1. Auflage, 488 Seiten, Englisch
- Verlag: John Wiley & Sons
- ISBN-10: 0471790273
- ISBN-13: 9780471790273
- Erscheinungsdatum: 24.07.2006
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