Theory and Application of Laser Chemical Vapor Deposition
(Sprache: Englisch)
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter...
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Klappentext zu „Theory and Application of Laser Chemical Vapor Deposition “
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
Inhaltsverzeichnis zu „Theory and Application of Laser Chemical Vapor Deposition “
1. Introduction.- 2. Pyrolytic LCVD.- 3. Photolytic LCVD.- 4. Pyrolytic LCVD Modeling.- 5. Photolytic LCVD Modeling.- A.1. Definitions of Energy Density, Irradiance, and Intensity.- A.2. Thermal Stress Analysis.- A.3. Volumetric Absorption Rate.- Nomenclature.- References.
Bibliographische Angaben
- Autoren: J. Mazumder , Aravinda Kar
- 2013, Softcover reprint of the original 1st ed. 1995, XII, 396 Seiten, Masse: 15,2 x 22,9 cm, Kartoniert (TB), Englisch
- Verlag: Springer, Berlin
- ISBN-10: 1489914323
- ISBN-13: 9781489914323
Sprache:
Englisch
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