Atomic Layer Deposition (PDF)

Tommi Kääriäinen is a researcher at the
Advanced Surface Technology Research Laboratory (ASTRaL) in
Lappeenranta University of Technology (LUT), Finland. He has over
nine years of experience in thin film deposition and analytical
techniques. He has especially focused on atomic layer deposition
(ALD) at low temperatures and recently on spatial and roll-to-roll
ALD.

David Cameron received his BSc in electrical and
electronic engineering from the University of Glasgow in 1972. In
2004, he joined LUT as Professor of Material Technology and
Director of ASTRaL. His research career has been in the area of
thin film deposition and since joining ASTRaL, his work has focused
on ALD. He has also worked on molecular beam epitaxy, plasma
chemical vapour deposition, magnetron sputtering, and sol-gel
deposition.

Marja-Leena Kääriäinen has conducted ALD
research for over 10 years. Her focus has been on the growth and
structure of nanoscale metal oxide films. She has a particular
interest in the photoactivity, photocatalytic activity, and
antibacterial properties of ALD-grown thin films. Her background is
in chemical engineering, which she studied at LUT and Michigan
Technological University. Currently, she is a researcher at
ASTRaL.

Arthur Sherman has 60 years of industrial experience,
which includes almost 20 years with General Electric, seven years
on the corporate staff of RCA, several years at Applied Materials,
and six years at Varian Associates. He earned a master's degree in
aeronautical engineering at Princeton University and a PhD at the
University of Pennsylvania. He has published extensively, including
approximately 50 research papers published in archive journals and
three scientific monographs.

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