X-Ray Lasers 2016

Proposal for Experiment Systems Using Laser Driven Heavy Ions and XFELs to Understand Physical Phenomena Occurring near the Incident Ion Path.- Part 3: Ultrafast X-Rays and Applications (11 papers).- Chapter 21. Laser driven plasma based incoherent X-ray sources at PALS and ELI Beamlines (Invited).- Chapter 22. Research on Laser Acceleration and Coherent X-ray Generation using J-KAREN-P laser (Invited).- Chapter 23. X-rays driven by Single-Cycle, Petawatt Lasers: A Path to Exawatt Pulses.-Chapter 24. Ultraintense X-Ray Radiation Photopumping of Exotic States of Matter by Relativistic Laser Plasma in the Radiation-Dominated Kinetic Regime (RDKR) (Invited).- Chapter 25. Enhanced coherent Thomson scattering in the few-cycle regime.- Chapter 26. Plasma channel undulator for narrow-bandwidth X-ray generation.- Chapter 27. Three-dimensional Supersonic Sapphire Micronozzles for Laser-Plasma Wakefield Accelerators.-Chapter 28. Generating ultrahigh brilliance quasi-monochromatic MeV -rays with high-quality LWFA electron beams.- Chapter 29. Features of Induced X-Ray Radiation and Possible Tandem FEL Realization on Channeling Particles.- Chapter 30. Features of Resonant Absorption and Short-Wavelength Laser Amplification in Realistic Media.- Part 4: Alternative X-Rays and Applications (5 papers).- Chapter 31. Observation and Investigation of Intensive Directional Quasi-coherent X-Ray Generated at Interaction of Cavitating Liquid Jet with a Target.- Chapter 32. Laser Plasma X-ray Source Based on Cryogenic Targets.-Chapter 33. Photoionization of Atomic Neon Induced Using Nanosecond Pulses of Extreme Ultraviolet (EUV).- Chapter 34. Effects of Equation of State on fluid simulations for laser-produced plasmas.- Part 5: X-Ray Imaging (9 papers).- Chapter 35. Soft X-Ray Laser Ablation Mass Spectrometry for Chemical Composition Imaging in Three Dimensions (3D) at the Nanoscale (Invited).- Chapter 36. Coherent Diffraction Imaging with Table-top XUV Sources (Invited).- Chapter 37. X-ray reflection imaging of inclined and obliquely illuminated objects (Invited).- Chapter 38. Nanoscale Imaging using a Compact Laser Plasma Source of Soft X-rays and Extreme Ultraviolet (EUV) (Invited).- Chapter 39. ERL-based Laser-Compton Scattering X-ray source for X-ray Imaging.- Chapter 40. 2D and 3D nanoscale imaging using high repetition rate laboratory based soft X-ray sources (Invited).- Chapter 41. The Observation Of Transient Thin Film Structures During The Femto-Second Laser Ablation Process By Using The Soft X-Ray Laser Probe.- Chapter 42. Spectrally-resolved spatial interference for single-shot temporal metrology of ultrashort soft X-ray pulses.- Part 6: X-Ray Optics and Damage (9 papers).- Chapter 43. Multilayer Mirrors for Focusing Objective in 40-nm Wavelength Region.- Chapter 44. Manufacture of High Precision, Multilayer Based Polarimeter Designed for Wide Energy Range from EUV to Soft X-ray.- Chapter 45. Proposal of Hypereutectic AlSi-based Multilayer Mirrors forWavelength between 20 nm and 25 nm.- Chapter 46. Irradiation damage test of Mo/Si, Ru/Si and Nb/Si multilayers using the soft X-ray laser built at QST.- Chapter 47. Mo/Si Multilayer-Coated Photodiode Detector for Monitoring Soft X-Ray Laser Intensity .- Chapter 48. Analysis of Reflection Signal from EUV Multilayer Mirror for Irradiation Induced Damage Study.- Chapter 49. Investigation of surface excitation effect for ablation of 4H-SiC substrate using double-pulse beam.- Chapter 50. Ablation of LiF and CsI by EUV Nanosecond Laser Pulse.- Chapter 51. Laser-Induced Damage on Silica Glasses by Irradiation of Soft X-Ray Laser Pulse.- Part 7: EUV Lithography (7 papers).- Chapter 52. Performance of over 100W HVM LPP-EUV light source (Invited).- Chapter 53. EUV free-electron laser requirements for semiconductor manufacturing (Invited).- Chapter 54. Coherent Lithography with Table Top Soft X-ray Lasers: Latest Achievements and Prospects (Invited).- Chapter 55. A 10-Hz short pulse CO2 laser system for extreme ultraviolet source.- Chapter 56. Modeling of Ablation of the Target Material for the Plasma for Coherent and Incoherent EUV Sources.- Chapter 57. Surface Layer Modification of Metal Nanoparticle Supported Polymer by Irradiation of Laser Driven Extreme Ultraviolet Light.- Chapter 58. Micrometer-scaled photo direct machining of polydimethylsiloxane using laser plasma EUV radiations.- Part 8: Instrumentation for Advanced X-Ray Applications (5 papers).- Chapter 59. Broadband High-Resolution Imaging Spectrometers for the soft X-Ray Range.- Chapter 60. Development of soft X-ray microscope in Water-window using laser produced plasma light source.- Chapter 61. Development of time-resolved small-angle X-ray scattering system using soft-X-ray laser.- Chapter 62. Development of a High Repetition Rate and High Pulse Energy Nd:YAG MOPA Laser System.- Chapter 63. Evaluation of a flat-field grazing incidence spectrometer for highly charged ion plasma emission in 110 nm.

Ultra-Intense Lasers) and the Asian Intense Laser Network, both in 2004. He has received several awards, including the American Physical Society's (APS) Award for Excellence in Plasma Physics Research. Y. Kato has published 350 papers. Hiroyuki Daido is currently the director of the Naraha Remote Technology Development Center, Japan Atomic Energy Agency (JAEA). He earned his doctorate degree from Osaka University in 1981. From 1991 to 2000 he worked at the Institute of Laser Engineering (ILE) Osaka University where he focused on CO2 laser-driven inertial fusion, soft x-ray lasers and incoherent soft x-ray sources and their applications. He moved to the Kansai Photon Science Institute (KPSI) of JAEA in 2000 where his work involves ultra-high intensity physics, and the development of ion sources and their applications. From 2009 to the present, he has been engaged in the study of laser technology for decommissioning nuclear facilities as well as maintaining social infrastructures. T. Kawachi is the director of the Kansai Photon Science Institute (KPSI) National Institutes for Quantum and Radiological Science and Technology (QST). He earned his Ph.D. from the Kyoto University in 1995. He started his career as a researcher at The Institute of Physical and Chemical Research (RIKEN) in 1995. He joined the Japan Atomic Energy Research Institute (JAERI) in 1998, where he took part in the table-top x-ray laser research project. He has achieved several remarkable results on laser-based plasma x-ray. Recently, he won the TAIZAN Award together with Dr. H. Daido from the Institute of Laser Technology.