Design for Manufacturability and Yield for Nano-Scale CMOS
(Sprache: Englisch)
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book...
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Klappentext zu „Design for Manufacturability and Yield for Nano-Scale CMOS “
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
Inhaltsverzeichnis zu „Design for Manufacturability and Yield for Nano-Scale CMOS “
1. Introduction of DFM/DFY2. Random Defects
3. Systematic yield
4. Systematic yield
5. Parametric yield
6. Design for yield
7. Summary and Conclusions
Autoren-Porträt von Charles Chiang, Jamil Kawa
Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA
Bibliographische Angaben
- Autoren: Charles Chiang , Jamil Kawa
- 2007, 2007, 255 Seiten, mit Abbildungen, Masse: 16 x 24,1 cm, Gebunden, Englisch
- Verlag: Springer Netherlands
- ISBN-10: 1402051875
- ISBN-13: 9781402051876
- Erscheinungsdatum: 26.07.2007
Sprache:
Englisch
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